A sem-image processing method for recognition and fast location of IC registration marksRAJA, N. K. L; RANGRA, K. J.Microelectronic engineering. 1990, Vol 11, Num 1-4, pp 681-685, issn 0167-9317Conference Paper

Micromachining of single crystal silicon in Fluorine based reactive plasma for the fabrication of high density nano-tip field-emitter arraysPANT, B. D; DESHMUKH, P. R; RANGRA, K. J et al.SPIE proceedings series. 2002, pp 1344-1347, isbn 0-8194-4500-2, 2VolConference Paper

Phenomenon of resist debris formation in electron beam lithography and its possible applicationDESHMUKH, P. R; RANGRA, K. J; SINGH, M et al.Vacuum. 1996, Vol 47, Num 11, pp 1305-1311, issn 0042-207XConference Paper

Micromachined low actuation voltage RF mems capacitive switches, technology and characterizationRANGRA, K. J; GIACOMOZZI, F; MARGESIN, B et al.International Semiconductor Conference. 2004, pp 165-168, isbn 0-7803-8499-7, 4 p.Conference Paper

Proximity exposure compensation and resit debris formation in electron beam lithographyDESHMUKH, P. R; SINGH, M; RANGRA, K. J et al.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1992, Vol 10, Num 1, pp 179-182, issn 0734-211XConference Paper